<p>➀ University of Southampton installed JEOL JBX-8100 G3 EBL machine enabling sub-5nm structure processing in thick resist with vertical sidewalls; </p><p>➁ The 200kV system supports electron displacement and multi-domain applications (electronics/photonics/bio-nano), with a 300mm-wafer JEOL JBX-A9 tool to be added in late 2024; </p><p>➂ Funded by EPSRC, the facility integrates SEM and deep-UV lithography, using Genisys software for pattern optimization with ±9nm overlay accuracy.</p>