06/20/2025, 05:15 AM UTC
imec与东京电子将合作开发2纳米以下制程节点Imec and Tokyo Electron to develop nodes beyond 2nm
➀ imec与东京电子（TEL）延长战略合作，专注于2纳米以下制程节点的半导体研发，涵盖图形化技术、逻辑器件、存储和3D集成；
➁ 双方此前合作取得了高数值孔径极紫外（High NA EUV）光刻和EUV抗蚀剂涂覆技术等突破，推动了EUV技术的量产应用；
➂ 新合作将围绕High NA图形化技术、CFET器件以及可持续制造工艺展开，旨在巩固双方在半导体领域的全球技术领导地位。
➀ Imec and Tokyo Electron (TEL) have extended their partnership to advance semiconductor R&D for nodes beyond 2nm, focusing on patterning, logic devices, memory, and 3D integration;
➁ Their prior collaboration achieved breakthroughs in High NA EUV lithography and EUV resist coating technology, critical for production-level EUV adoption;
➂ The renewed efforts target High NA patterning, CFET devices, and sustainable manufacturing processes to drive innovation and reinforce global semiconductor leadership.
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本文由大语言模型（LLM）生成，旨在为读者提供半导体新闻内容的知识扩展（Beta）。
