04/26/2025, 10:46 AM UTC
晶圆扫描仪控制：方法与发展Control of Wafer Scanners: Methods and Developments
➀ 本文重点介绍了半导体工业中晶圆扫描仪的控制设计方面；
➁ 讨论了在满足精度和速度不断提高的需求方面的控制设计挑战；
➂ 涵盖了包括光源生成、光学和计量系统以及掩模和晶圆平台系统的机电一体化系统；
➃ 解决了包括拒绝高频混叠干扰、大规模状态重建、振动控制和热建模在内的控制挑战。
➀ The paper highlights control design aspects of wafer scanners in the semiconductor industry;
➁ Discusses challenges in control design to meet increasing demands on accuracy and speed;
➂ Covers mechatronic systems including light source generation, optical and metrology systems, and reticle and wafer stage systems;
➃ Addresses control challenges such as rejection of high-frequency aliasing disturbances, large-scale state reconstruction, vibration control, and thermal modeling.
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本文由大语言模型（LLM）生成，旨在为读者提供半导体新闻内容的知识扩展（Beta）。
