<p>➀ The paper highlights control design aspects of wafer scanners in the semiconductor industry;</p><p>➁ Discusses challenges in control design to meet increasing demands on accuracy and speed;</p><p>➂ Covers mechatronic systems including light source generation, optical and metrology systems, and reticle and wafer stage systems;</p><p>➃ Addresses control challenges such as rejection of high-frequency aliasing disturbances, large-scale state reconstruction, vibration control, and thermal modeling.</p>