01/08/2025, 08:51 PM UTC
佳能的纳米压印光刻技术旨在与极紫外光刻竞争Canon's NIL Technology Competes with EUV Lithography
<p>➀ 佳能交付了一种可能颠覆最先进硅芯片制造方式的技术，即纳米压印光刻技术（NIL）。</p><p>➁ NIL能够绘制出小至14纳米的电路特征，与英特尔、AMD和英伟达的处理器相当。</p><p>➂ 佳能的方法与由荷兰阿斯麦独家生产的极紫外光刻系统完全不同。</p><p>➀ Canon has delivered the first commercial version of a technology that could one day revolutionize the manufacturing of the most advanced silicon chips.</p><p>➁ NIL (nanoimprint lithography) can draw circuit features as small as 14 nanometers, matching the level of processors produced by Intel, AMD, and NVIDIA.</p><p>➂ Canon's approach is different from the EUV lithography system produced exclusively by ASML of the Netherlands.</p>
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