02/25/2025, 09:02 PM UTC
高NA EUV光刻机，重要里程碑High NA EUV Lithography Machine Achieves Significant Milestone
<p>➀ 英特尔宣布，首批两台尖端光刻机正在其工厂生产，早期数据显示它们比早期型号更可靠。</p><p>➁ 英特尔使用ASML的高数值孔径（NA）光刻机在一个季度内生产了30,000个晶圆，这些晶圆可以生产数千个计算芯片。</p><p>➂ 英特尔计划利用高NA机器帮助开发所谓的18A制造技术，该技术计划于今年晚些时候与新一代PC芯片一起进行量产。</p><p>➀ Intel announced that the first two of the cutting-edge lithography machines are being produced in its factory, with early data showing they are more reliable than earlier models.</p><p>➁ Intel used ASML's high numerical aperture (NA) lithography machines to produce 30,000 wafers in a quarter, which can produce thousands of computing chips.</p><p>➂ Intel plans to use the High NA machines to help develop the so-called 18A manufacturing technology, which is scheduled for mass production later this year with the next generation of PC chips.</p>
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02/25/2025, 08:15 PM UTC
高NA EUV光刻机取得重要里程碑High NA EUV Lithography Machine Achieves Significant Milestone
<p>➀ 英特尔已经开始在其工厂中使用阿斯麦的先进光刻机生产，初步数据显示其可靠性高于早期型号。</p><p>➁ 英特尔去年成为首家接收这些机器的芯片制造商，计划利用它们开发18A制造技术，预计今年晚些时候与新一代PC芯片一起进行量产。</p><p>➂ imec展示了使用高NA EUV单图案化技术图案化的20nm间距金属线的首个电气测试结果，显示出良好的电气产量和较少的随机缺陷。</p><p>➀ Intel has begun production with the first two of ASML's advanced lithography machines in its factory, showing early data indicating increased reliability over earlier models.</p><p>➁ Intel, which became the first chip manufacturer to receive these machines last year, plans to use them to develop 18A manufacturing technology for mass production later this year.</p><p>➂ Imec has demonstrated the first electrical yield results from 20nm spacing metal lines patterned using High NA EUV single patterning technology, showing good electrical yield and fewer random defects.</p>
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本文由大语言模型（LLM）生成，旨在为读者提供半导体新闻内容的知识扩展（Beta）。
