<p>➀ SK Hynix becomes the first memory manufacturer to install ASML's High-NA EUV lithography system (EXE:5200B) at its M16 fab, aiming to streamline DRAM production for AI and HPC markets;</p><p>➁ The 0.55 NA system enables 1.7x smaller circuit patterns and 2.9x higher density, reducing multi-patterning steps while targeting next-gen HBM development;</p><p>➂ Accelerating equipment deployment by six months gives SK Hynix a competitive edge over Samsung, positioning it to lead in AI memory solutions with earlier mass production capabilities.</p>