05/01/2025, 03:20 AM UTC
中国突破EUV光源瓶颈，构建新实验平台China Breaks EUV Light Source Barrier, Builds New Experimental Platform
➀ 中国在半导体研究方面取得了突破，建立了完整的EUV光源实验平台；
➁ 上海光机所在EUV开发项目中实现了3.42%的峰值能量转换效率；
➂ 这项进展凸显了中国在面临日益增加的美国出口限制时坚持技术独立性的决心；
➃ 中国已成为ASML最大的单一市场，占总销售额的36.1%。
➀ China has achieved a breakthrough in semiconductor research by establishing a fully functional EUV light source experimental platform;
➁ The Shanghai Institute of Optics and Fine Mechanics has reached a peak energy conversion efficiency of 3.42% in their EUV development efforts;
➂ This progress underscores China's commitment to technological independence despite increasing US export restrictions;
➃ China has become ASML's largest single market, accounting for 36.1% of total sales.
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本文由大语言模型（LLM）生成，旨在为读者提供半导体新闻内容的知识扩展（Beta）。
