10/25/2024, 09:46 PM UTC
EUV掩模专栏——多束光刻机的游戏规则改变者EUV Masking Column - The Game Changer of Multi-Beam Lithography
<p>➀ 由eBeam Initiative主办的第十一届Luminaries调查报告显示，多束掩模写入器的采购预测强劲，这将促进极紫外（EUV）和步进重复光刻掩模的增长。</p><p>➁ 在与SPIE光掩模技术会议同时举行的活动中，专家们讨论了步进重复光刻掩模采用所面临的挑战。</p><p>➂ 该调查涉及半导体生态系统内的44家公司的行业领军人物，D2S, Inc.的首席执行官Aki Fujimura和DNP名誉研究员Naoya Hayashi领导了关于调查结果的小组讨论。</p><p>➀ The 11th Luminaries survey report by eBeam Initiative indicates a strong purchase prediction for multi-beam mask writers, promoting the growth of EUV and step-and-repeat lithography masks.</p><p>➁ Experts discussed the challenges faced in the adoption of step-and-repeat lithography masks at an event held concurrently with the SPIE Mask Technology Conference.</p><p>➂ The survey involved industry leaders from 44 companies in the semiconductor ecosystem, with Aki Fujimura, CEO of D2S, Inc., and Naoya Hayashi, DNP Honorary Researcher, leading the discussion on the survey results.</p>
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