10/04/2024, 09:17 AM UTC
康宁推出EXTREME ULE玻璃，可支持High NA EUV光刻Corning Introduces EXTREME ULE Glass, Supporting High NA EUV Lithography
➀ 康宁推出了新型超低膨胀（ULE）玻璃材料EXTREME ULE，旨在支持High NA EUV光刻技术，用于大规模生产先进微芯片。➁ 该材料具有极低的热膨胀特性，能提升EUV掩模的性能。➂ 它的卓越平整度有助于减少芯片生产中的不必要变化，使得高级薄膜和光刻胶的应用成为可能。➃ EXTREME ULE玻璃是康宁ULE产品线的一部分，这是一种二氧化钛硅酸盐玻璃，具有接近零的膨胀特性，长期以来一直用于EUV掩模和光刻反射镜。➀ Corning has launched a new ultra-low expansion (ULE) glass material called EXTREME ULE, designed to support High NA EUV lithography for the mass production of advanced microchips. ➁ The material boasts ultra-low thermal expansion, enhancing the performance of EUV masks. ➂ Its exceptional flatness minimizes unnecessary changes in chip manufacturing, allowing for the use of advanced thin films and lithography materials. ➃ EXTREME ULE glass is part of Corning's ULE product line, a titania silicate glass with near-zero expansion properties, traditionally used in EUV masks and lithography mirrors.
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