10/23/2024, 01:35 PM UTC
中国光刻胶，离日本还有多大差距？China's Photoresist: How Far Behind Japan?
<p>➀ 光刻胶是芯片制造的关键材料，中国企业为打破国际垄断取得了显著进步。</p><p>➁ 文章解释了光刻胶的工作原理及其在各种行业中的应用。</p><p>➂ 强调了中国公司在光刻胶领域的进展，包括一些国内公司在开发和生产各种类型光刻胶方面的成功。</p><p>➃ 然而，它强调了中日在光刻胶技术上的巨大差距，特别是在高端和先进市场上。</p><p>➄ 文章讨论了日本光刻胶公司的强大原因，并建议中国公司需要关注研发、产业化以及构建产业生态系统以迎头赶上。</p><p>➀ Photoresist is a critical material for chip manufacturing, with Chinese companies making significant progress in breaking international monopolies.</p><p>➁ The article explains the working principle of photoresist and its applications in various industries.</p><p>➂ It highlights the progress made by Chinese companies in the field of photoresist, including the success of some domestic companies in developing and producing various types of photoresist.</p><p>➃ However, it emphasizes the significant gap between Chinese and Japanese photoresist technologies, particularly in the high-end and advanced markets.</p><p>➄ The article discusses the reasons behind the strength of Japanese photoresist companies and suggests that Chinese companies need to focus on research and development, industrialization, and building an industry ecosystem to catch up.</p>
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