12/13/2024, 09:12 PM UTC
EUV光刻胶：最新进展与挑战EUV Photolithography Gel: The Latest Development and Challenges
<p>➀ 从20世纪70年代至今，EUV光刻胶的演变，包括各种材料的研究。</p><p>➁ EUV光刻的独特之处，如短波长制造、特殊的反射光学系统以及特殊的材料系统。</p><p>➂ 常见的EUV光刻胶类型，包括化学放大、无机、非化学放大和混合胶。</p><p>➃ EUV光刻胶开发中的主要挑战，如灵敏度、分辨率和线边缘粗糙度（LER）、除气和热稳定性。</p><p>➀ The evolution of EUV photolithography gel from the 1970s to the present day, including various materials research.</p><p>➁ The unique aspects of EUV photolithography, such as short-wavelength manufacturing, special reflective optical systems, and special material systems.</p><p>➂ Common types of EUV photolithography gel, including chemical amplification, inorganic, non-chemical amplification, and hybrid gel.</p><p>➃ The main challenges in the development of EUV photolithography gel, such as sensitivity, resolution and LER, outgassing, and thermal stability.</p>
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