12/13/2024, 01:12 PM UTC
EUV光刻胶：最新进展与挑战EUV Photolithography Gel: The Latest Development and Challenges
➀ 从20世纪70年代至今，EUV光刻胶的演变，包括各种材料的研究。
➁ EUV光刻的独特之处，如短波长制造、特殊的反射光学系统以及特殊的材料系统。
➂ 常见的EUV光刻胶类型，包括化学放大、无机、非化学放大和混合胶。
➃ EUV光刻胶开发中的主要挑战，如灵敏度、分辨率和线边缘粗糙度（LER）、除气和热稳定性。
➀ The evolution of EUV photolithography gel from the 1970s to the present day, including various materials research.
➁ The unique aspects of EUV photolithography, such as short-wavelength manufacturing, special reflective optical systems, and special material systems.
➂ Common types of EUV photolithography gel, including chemical amplification, inorganic, non-chemical amplification, and hybrid gel.
➃ The main challenges in the development of EUV photolithography gel, such as sensitivity, resolution and LER, outgassing, and thermal stability.
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