02/27/2025, 08:09 AM UTC
EUV Tech公司推出HVM就绪的EUV区域透镜显微镜用于掩模缺陷审查EUV Tech, Inc. Introduces HVM-Ready EUV Zoneplate Microscopy for Mask Defect Review
➀ EUV Tech公司推出了下一代EUV区域透镜显微镜——AIRES显微镜，该显微镜可以捕捉和表征光刻掩模缺陷。
➁ AIRES显微镜拥有专利的低像差区域透镜成像系统，支持多种增强成像模式以进行缺陷分类。
➂ 该技术使光刻掩模制造商能够在不进行昂贵的打印检查的情况下进行有针对性的修复，并且设计有较低的所有权成本。
➀ EUV Tech, Inc. has introduced the next generation of EUV zoneplate microscopy, the AIRES microscope, which captures and characterizes photomask defects.
➁ The AIRES microscope has a patented low-aberration zoneplate imaging system and supports a variety of enhanced imaging modes for defect classification.
➂ The technology enables photomask manufacturers to make targeted repairs without expensive print checks and is designed for lower cost of ownership.
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